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Domů PodporaStipendia, rezidence

Eyebeam rezidence v Chelsea

New York, USA
Nezisková organizace EyeBeam, centrum pro umění a technologie, otevírá svůj rezidenční program pro podzim a zimu 2011. V rámci programu bude uděleno šest rezidenčních pobytů na pět mesíců. Stipendisté obdrží 5 000 USD a ateliéry v Chelsea. Uzávěrka pro podávání žádostí je 19. května 2011.

Eyebeam Residencies
open call for Fall/Winter 2011
APPLICATION DEADLINE: All applications must be received via online application by 12:00PM, Monday, May 30, 2011. All applicants will be informed of their application status by July 19, 2011.

CONTEXT: Eyebeam is the leading art and technology center in the USA, providing a fertile context and state-of-the-art tools for digital experimentation. It is a lively incubator of creativity and investigation, where artists and technologists actively engage with each other and the culture at large, addressing the issues and concerns of our time.

OVERVIEW: Apply now for Eyebeam's Fall/Winter 2011 Residency cycle. Residents are granted a $5,000 stipend and 24/7 access to Eyebeam's state of the art digital design and fabrication studios at our Chelsea facility.

Up to six Residents will be selected for the upcoming 5-month cycle, which will run from September 1, 2011 to January 31, 2012.

SUPPORT: Eyebeam residencies support the creative research, production and presentation of initiatives querying art, technology and culture. The residency is a period of concentration and immersion in artistic investigation, research or production of visionary, experimental applications and projects. It is a chance to use the time, space and tools at Eyebeam to reach the next stage of your practice. Check out what our current and past residents have been doing on our website, it is a good way to get a sense of the kind of work we support.

INTERNATIONAL APPLICATIONS: International applicants are welcome to apply, although we do not have the resources to provide travel or accommodation. We are happy to work with selected applicants, where required, to help them to secure funds to cover these expenses. International Residents are responsible for securing their own visas for the Residency period. We are happy to provide necessary paperwork and advice to help expedite the process.

International applicants are encouraged to apply for the cycle prior to their intended start date, to ensure ample time to prepare travel and visa.

PARTICIPATION: Residents are expected to participate in public events including workshops, Open Office Hours (Tuesdays, 2 - 4), demonstrations of research in progress, panel discussions, and online releases, in addition to Open Studios (two-day events, held once during the residency period).

The program term is from beginning of September 2011 to the end of January 2012. Residents will be selected from an open call, based on the quality of the work being proposed, the applicability of Eyebeam’s tools and resources in realizing and supporting the work, and in consideration of the overarching research themes and activities of the organization.

Core to Eyebeam’s methodology is the brokering of relationships between artists, hackers, coders, engineers and other creative technologists in the context of an open and shared culture of investigation and critique. We foster and facilitate relationships whereby technologists and artists come together to germinate and incubate their ideas, develop new processes, and create new works through a period of immersion in a social and professional context which is rich in technology, expertise and ideas. Collaborative relationships at Eyebeam will be fostered though group critiques, discussions and projects; and between other Eyebeam Fellows, Residents, and Staff.

RESEARCH GROUPS: Residents will have the opportunity to collaborate within our Research Groups. Research Groups bring together creative practitioners working at Eyebeam as well as expert individual participants and external partners. Initiatives led by Eyebeam Research Groups have included public outcomes such as seminars, workshops, publications and exhibitions.

APPLICATION REQUIREMENTS: Applications are only accepted via our online application system. Applications received after the deadline of noon, 12:00 (EST) PM, May 30, 2011, will not be accepted. All applications and work samples must be submitted through the online form. No exceptions will be made. You can create a user/password during the application process and log back into the server to update your application before the final deadline.

Complete applications must include the following information:
• Contact Information
• Resume or CV (.rtf, .pdf, .doc)
• Work samples in the form of URLs. Include a project description with your work sample that explains your contribution to the piece, how it is meant to be viewed and how it relates to your proposed project(s)/research.
• Concise responses to all application questions. Incomplete applications will not be considered.

APPLICATION DEADLINE: All applications must be received via online application by 12:00PM, Monday, May 30, 2011. All applicants will be informed of their application status by July 19, 2011.  

Roddy Schrock
540 W. 21st Street
NY 10011 New York
tel: +1 - 212.937.6580
fax: +1 - 212.937.6582

(03.05.2011) ZDROJ:

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